JPH0129295B2 - - Google Patents
Info
- Publication number
- JPH0129295B2 JPH0129295B2 JP57197671A JP19767182A JPH0129295B2 JP H0129295 B2 JPH0129295 B2 JP H0129295B2 JP 57197671 A JP57197671 A JP 57197671A JP 19767182 A JP19767182 A JP 19767182A JP H0129295 B2 JPH0129295 B2 JP H0129295B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- cathode
- potential
- hollow part
- control electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 61
- 238000010586 diagram Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 4
- 238000000992 sputter etching Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000005315 distribution function Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 238000005381 potential energy Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000005658 nuclear physics Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000004157 plasmatron Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57197671A JPS5987738A (ja) | 1982-11-12 | 1982-11-12 | イオン発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57197671A JPS5987738A (ja) | 1982-11-12 | 1982-11-12 | イオン発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5987738A JPS5987738A (ja) | 1984-05-21 |
| JPH0129295B2 true JPH0129295B2 (en]) | 1989-06-09 |
Family
ID=16378392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57197671A Granted JPS5987738A (ja) | 1982-11-12 | 1982-11-12 | イオン発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5987738A (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03266346A (ja) * | 1990-03-14 | 1991-11-27 | Toshiba Corp | イオン生成装置 |
| JP7404134B2 (ja) * | 2020-03-30 | 2023-12-25 | 住友重機械工業株式会社 | Ｐｉｇイオン源装置およびイオン源ガス供給システム |
-
1982
- 1982-11-12 JP JP57197671A patent/JPS5987738A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5987738A (ja) | 1984-05-21 |
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